 |
 |
|
SUBSTRATE
WET PROCESS SYSTEM |
||
所有化学
处理工艺由PLC 程序控制，通过液晶触摸屏进行菜操作，系统按客户要求分为手动/半自动/自动进行操做。 |
||
All process
recipes are controlled by PLC system with its touch screen. Wet
process system can be built as auto/ semi auto/ manually per
customer specification. |
||
1 |
半导体基片湿处理工艺及清洗 |
|
2
|
蓝宝石、光学基片湿处理工艺及清洗 |
|
3 |
平板显示器（ FPD ）湿处理工艺及清洗 |
|
4
|
太阳能电池板湿处理工艺及清洗 |
|
1 |
Semiconductor substrate wet process and clean |
|
2
|
Sapphire/optical substrate wet process and clean |
|
3 |
FPD wet process and clean |
|
4
|
Solar cell wafer wet process and clean |
|
|
工艺流程图 |
||
 |
||
  |
 |
|
 |
 |
|
SUBSTRATE CLEAN SYSTEM |
SINGLE SUBSTRATES WET PROCESS SYSTEM |
|
 |
 |
|
所有化学处理均由PLC系统程序控制，通过液晶触摸屏进行菜单操作,单/双面化学湿处理。 |
||
All process recipes are controlled by PLC system with
its touch screen, Single/Double sides chemical wet process. |
||
 |
 |
|
PARTS CLEAN WET BENCH |
CHEMICAL DELIVERY SYSTEM |
|
 |
 |
|
用于小型钟罩及配件的清洗。 |
用于基片湿处理设备化学液的循环过滤及输送。 |
|
Is used to clean small bell jar and small parts. |
CDS is used for chemical filtration/ delivering in the substrates
wet process. |
|
 |
 |
|
WET BENCH AUTOMATION ROBOT |
IPA DRYER |
|
 |
 |
|
用于基片湿处理过程中基片工艺片架传送。 |
基于SNA专利技术，用于基片无水迹，无颗粒增加，清洗及取干。 |
|
Transferring substrate cassettes during their wet clean process. |
Based on SNA patented technology, used for substrates clean and dry
with zero particle adding and water mark free. |
|
 |
 |
|
SOLVENT RECOVERY SYSTEM |
TUBE/BELL JAR ,QUARTS PARTS CLEAN SYSTEM |
|
 |
 |
|
用于有机化学液回收、再生。使其电阻率、颗粒、金属离子达到/超过原液的技术指标。 |
本设备为喷淋、浸泡式清洗机，用于半导体工业炉管/石英管器皿及其管架的清洗，干进/干出。 |
|
Used for solvent chemical recovery process to
make resistivity particle metal ion meets (or better than) original
chemical specification. |
This equipment is used to clean quartz tube/bell jar, quartz parts and their paddles by chemical spraying and soaking. Dry In/Dry out. |
|
